Инд. авторы:	Baklanova N.I., Lozanov V.V., Kul'kov A.A., Antipov E.A., Titov A.T.
Заглавие:	Behavior of Some Refractory Hafnium and Tantalum Compounds in Plasma Flows
Библ. ссылка:	Baklanova N.I., Lozanov V.V., Kul'kov A.A., Antipov E.A., Titov A.T. Behavior of Some Refractory Hafnium and Tantalum Compounds in Plasma Flows // Inorganic Materials. - 2019. - Vol.55. - Iss. 3. - P.231-236. - ISSN 0020-1685. - EISSN 1608-3172.
Внешние системы:	DOI: 10.1134/S002016851903004X; SCOPUS: 2-s2.0-85066956328; WoS: 000470331000004;
Реферат:	eng: By reacting tantalum or hafnium carbide with iridium in the presence of a small amount of silicon, we have prepared refractory hafnium- and tantalum-containing materials consisting of a mixture of phases: the intermetallic compound MIr3, recrystallized tantalum or hafnium carbide, and iridium silicide. We have studied the behavior of the materials during an exposure to a high-speed plasma flow at a sample surface temperature of 2000 degrees C and demonstrated that, owing to their special microstructure, the absence of pores, and the low oxidation rate of the iridium-containing components, they exhibit a good ablation resistance and that the hafnium system withstands a longer exposure.
Ключевые слова:	PHASE; tantalum carbide; oxidation resistance; intermetallic phase; iridium; IRIDIUM; hafnium carbide;
Издано:	2019
Физ. характеристика:	с.231-236