Инд. авторы:	Korolkov V.P., Konchenko A.S., Cherkashin V.V., Mironnikov N.G.
Заглавие:	DEVELOPMENT OF METHODS FOR FORMATION AND TESTING OF PHOTORESIST FILMS WITH A DESIRED THICKNESS PROFILE WHEN FABRICATING CONFORMAL CORRECTORS
Библ. ссылка:	Korolkov V.P., Konchenko A.S., Cherkashin V.V., Mironnikov N.G. DEVELOPMENT OF METHODS FOR FORMATION AND TESTING OF PHOTORESIST FILMS WITH A DESIRED THICKNESS PROFILE WHEN FABRICATING CONFORMAL CORRECTORS // Компьютерная оптика. - 2016. - Vol.40. - Iss. 4. - P.482-488. - ISSN 0134-2452. - EISSN 2412-6179.
Внешние системы:	DOI: 10.18287/2412-6179-2016-40-4-482-488; SCOPUS: 2-s2.0-84988909528; WoS: 000408261700007;
Реферат:	eng: A process of manufacturing conformal correctors for solid state YAG:Nd3+ lasers is discussed. It is proposed that a maskless lithography method should be used for fabricating a photoresist film with a desired thickness profile as an alternative to the proximity lithography based on half-tone masks. The use of a specular spectral scatterometry method for the testing of the conformal corrector shape at an early stage of photoresist profile formation is reported. A combination of these two methods makes the corrector manufacturing process significantly cheaper and faster.
Ключевые слова:	LITHOGRAPHY; profilometry; thin film thickness measurement; DEVICE; maskless lithography; specular spectral scatterometry; conformal correctors;
Издано:	2016
Физ. характеристика:	с.482-488