Инд. авторы:	Derevyanko D.I., Shelkovnikov V.V., Orlova N.A., Goldenberg B.G., Lemzyakov A.G., Korolkov V.P.
Заглавие:	Fabrication of High-aspect-ratio Microstructures for LIGA-technology by Sinchrotron Radiation Polymerisation of Thetetraacrylate Monomer
Библ. ссылка:	Derevyanko D.I., Shelkovnikov V.V., Orlova N.A., Goldenberg B.G., Lemzyakov A.G., Korolkov V.P. Fabrication of High-aspect-ratio Microstructures for LIGA-technology by Sinchrotron Radiation Polymerisation of Thetetraacrylate Monomer // Physics Procedia. - 2017. - Vol.86. - P.122-126. - ISSN 1875-3884.
Внешние системы:	DOI: 10.1016/j.phpro.2017.01.032; SCOPUS: 2-s2.0-85017388413;
Реферат:	eng: The high-aspect ratio microstructures were fabricated by action of synchrotron x-ray on the synthesized tetraacrylate monomer: 3-[4-({4-[2,3-bis(prop-2-enoyloxy)propoxy]phenyl}sulfanyl)phenoxy]-3-(prop-2-enoyloxy)propan-2-yl prop-2-enoate. The storage ring VEPP-3 (electron energy is 2 GeV) at the station «LIGA» of BINP SB RAS was used as the source of the synchrotron radiation. The dependence of the thickness of the x-ray polymerized samples vs. the absorbed dose was measured in the range 1-100 kJ/cm3. The possibility of use synthesized tetraacrylate monomer for the microstructures recording with aspect ratio 1:25 by the x-ray lithography metod was demonstrated. © 2017 The Authors.
Ключевые слова:	LIGA-technology; Aspect ratio; Synchrotron x rays; LIGA technology; High aspect ratio microstructures; Electron energies; Absorbed dose; X ray lithography; Synchrotrons; polymerization; Polymerization; Photonics; Monomers; Microstructure; Lithography; Electron energy levels; x-ray lithography; tetraacrylate monomer; Synchrotron radiation;
Издано:	2017
Физ. характеристика:	с.122-126
Конференция:	Название: International Conference on Photonics of Nano- and Bio-Structures, PNBS-2015, Russia and the International Conference on Photonics of Nano- and Micro-Structures, PNMS-2015 Даты проведения: 2015-06-19 - 2015-06-20