Инд. авторы: Rubanov S., Suvorova A., Popov V.P., Kalinin A.A., Pal'yanov Y.N.
Заглавие: Fabrication of graphitic layers in diamond using FIB implantation and high pressure high temperature annealing
Библ. ссылка: Rubanov S., Suvorova A., Popov V.P., Kalinin A.A., Pal'yanov Y.N. Fabrication of graphitic layers in diamond using FIB implantation and high pressure high temperature annealing // Diamond and Related Materials. - 2016. - Vol.63. - P.143-147. - ISSN 0925-9635. - EISSN 1879-0062.
Внешние системы: DOI: 10.1016/j.diamond.2015.11.017; РИНЦ: 26972116; SCOPUS: 2-s2.0-84959367101; WoS: 000371942700026;
Реферат: eng: We have used high pressure high temperature annealing (HPHT) for graphitisation of implanted layers in diamond created by 30 keV Ga+ focused ion beam. Electron microscopy has been used to investigate the implanted layers. It has been revealed that, unlike annealing at vacuum pressure, the graphitization during HPHT annealing occurred through epitaxial growth of graphite (002) planes parallel to (111) diamond planes. High quality of graphite was confirmed by high resolution electron microscopy and electron energy loss spectroscopy. (C) 2015 Elsevier B.V. All rights reserved.
Ключевые слова: MEMBRANES; DAMAGE; AMORPHIZATION; SINGLE-CRYSTAL DIAMOND; Graphitisation; Ion implantation; Diamond; ION-IMPLANTATION; BEAM;
Издано: 2016
Физ. характеристика: с.143-147
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