Инд. авторы:	Yaacoub L., Schamm-Chardon S., Ovsyuk N.N., Zwick A., Groenen J.
Заглавие:	Raman-Brillouin scattering from a thin Ge layer: Acoustic phonons for probing Ge/GeO2 interfaces
Библ. ссылка:	Yaacoub L., Schamm-Chardon S., Ovsyuk N.N., Zwick A., Groenen J. Raman-Brillouin scattering from a thin Ge layer: Acoustic phonons for probing Ge/GeO2 interfaces // Applied Physics Letters. - 2014. - Vol.104. - Iss. 6. - Art.061601. - ISSN 0003-6951. - EISSN 1077-3118.
Внешние системы:	DOI: 10.1063/1.4864790; SCOPUS: 2-s2.0-84937061387; WoS: 000331803800018;
Реферат:	eng: We report on Raman-Brillouin scattering by acoustic phonons from a thin Ge layer. The high frequency acoustic phonons involved in this scattering are used to probe the native oxide present on top of the Ge layer. By comparing experiment and photoelastic modelling, a quantitative analysis is performed which shows that an interfacial layer is located in between the Ge and GeO2 oxide layers. The native oxide is found to be composed of a 0.5nm thick interfacial layer and a 1nm thick GeO2 layer on top of it. Sensitivity down to the sub-nm scale is evidenced. © 2014 AIP Publishing LLC.
Ключевые слова:	Oxide layer; Native oxides; Interfacial layer; High frequency acoustics; Ge layers; Acoustic wave scattering; Acoustic phonons; Phonons; Germanium; Electromagnetic wave emission; Brillouin scattering; Comparing experiments;
Издано:	2014
Физ. характеристика:	061601