| Инд. авторы: | Gorobchuk A.G. |
| Заглавие: | Numerical model of plasma-chemical etching of silicon in CF4/H2 plasma |
| Библ. ссылка: | Gorobchuk A.G. Numerical model of plasma-chemical etching of silicon in CF4/H2 plasma // Abstracts of the International Conference "Computational and Informational Technologies in Science, Ingenering and Education" (September 24-27, 2015) / Al-Farabi KazNU. - 2015. - Almaty: Al-Farabi KazNU. - P.127-128. - ISBN: 978-601-04-1389-4. |
| Внешние системы: | DOI: 10.1007/978-3-319-25058-8_5; SCOPUS: 2-s2.0-84951988706; |
| Реферат: | eng: The 2D mathematical model of plasma-chemical etching process, where the gas flow of the mixture was described by the equations of multicomponent physical-chemical hydrodynamics, was presented. The silicon etching in CF4/H2 gas mixture was studied. The chemical kinetic model contained 2 8 gas-phase reactions of dissociation and recombination processes and 6 heterogeneous reactions on the wafer, which included the products - F, F2, CF2, CF3, CF4, C2F6, H, H2, HF, CHF3, CH2F2. The concentrations of chemical components were calculated from the system of conservation equations included the mentioned gas-phase reactions. The governing equations were numerically solved by iterative finite difference splitting-up method. It is shown that the CF4/H2 system is characterized by lower fluorine concentrations and higher CF2, CF3 coverage of silicon surface compared to the CF4/O2 system. © Springer International Publishing Switzerland 2015. |
| Ключевые слова: | Multicomponent gas-mixtures; Heterogeneous reactions; Governing equations; Fluorine concentrations; Conservation equations; Chemical-etching process; Chemical kinetic model; Silicon wafers; Silicon; Phase interfaces; Numerical methods; Gases; Iterative methods; Gas mixtures; Fluorine; Flow of gases; Etching; Chemical reactions; Plasmachemical etching technology; Numerical methods; Multicomponent gas mixtures; Mathematical modeling; Mathematical models; Recombination process; |
| Издано: | 2015 |
| Физ. характеристика: | с.127-128 |
| Конференция: | Название: International Conference «Computational and Informational Technologies in Science, Engineering and Education» Аббревиатура: CITech-2015 Город: Алма-Ата Страна: Казахстан Даты проведения: 2015-09-24 - 2015-09-27 Ссылка: http://conf.nsc.ru/citech-2015 |