Инд. авторы:	Shokin Yu.I., Grigoryev Yu.N., Gorobchuk A.G.
Заглавие:	Advanced optimization of etching process in radial-flow plasma-chemical reactor
Библ. ссылка:	Shokin Yu.I., Grigoryev Yu.N., Gorobchuk A.G. Advanced optimization of etching process in radial-flow plasma-chemical reactor // International Journal of Computational Fluid Dynamics. - 2000. - Vol.9. - Iss. 1. - P.spec. iss. - ISSN 1061-8562. - EISSN 1029-0257.
Издано:	2000