| Инд. авторы: | Grigoryev Yu.N., Gorobchuk A.G. |
| Заглавие: | Numerical optimization of silicon plasma etching in CF-4/O-2 parent mixture |
| Библ. ссылка: | Grigoryev Yu.N., Gorobchuk A.G. Numerical optimization of silicon plasma etching in CF-4/O-2 parent mixture // The Seventh Russian - Japanese International Symposium on Computational Fluid Dynamics, July 31-6 August, 2000, Moscow. Moscow: Computing center RAS, 2000, 2000. - P.72-73. |
| Издано: | Moscow: Computing center RAS, 2000 |
| Физ. характеристика: | с.72-73 |