Инд. авторы: Shokin Yu.I., Grigoryev Yu.N., Gorobchuk A.G.
Заглавие: Numerical modeling and optimization of plasma-chemical etching reactors
Библ. ссылка: Shokin Yu.I., Grigoryev Yu.N., Gorobchuk A.G. Numerical modeling and optimization of plasma-chemical etching reactors // 16th International Conference on Numerical Methods in Fluid Dynamics. Final Program. Arcachon, 1998. - P.315-316.
Издано: Arcachon: , 1998
Физ. характеристика: с.315-316