| Инд. авторы: | Grigoryev Yu.N., Gorobchuk A.G. |
| Заглавие: | Advanced numerical models of plasma - chemical etching of silicon |
| Библ. ссылка: | Grigoryev Yu.N., Gorobchuk A.G. Advanced numerical models of plasma - chemical etching of silicon // Proceedings of The Sixth Japan-Russia Joint Symposium on Computational Fluid Dynamics. Nagoya: Nagoya University, 1998, 1998. - P.68-71. |
| Издано: | Nagoya: Nagoya University, 1998 |
| Физ. характеристика: | с.68-71 |