Инд. авторы: Gritsenko V.A., Morokov Yu.N., Novikov Yu.N., Petrenko I.P., Svitasheva S.N., Wong H., Kwok R., Chan R.
Заглавие: Characterization of the Silicon Nitride-Thermal Oxide Interface in ONO Structures by ELS, XPS, Ellipsometry, and Numerical Simulation
Библ. ссылка: Gritsenko V.A., Morokov Yu.N., Novikov Yu.N., Petrenko I.P., Svitasheva S.N., Wong H., Kwok R., Chan R. Characterization of the Silicon Nitride-Thermal Oxide Interface in ONO Structures by ELS, XPS, Ellipsometry, and Numerical Simulation // Proceedings of the 21 Int. Conf. on Microelectronics, 14-17 Sept., 1997. Nis: Yugoslavia, 1997, 1997. - P.111-114.
Издано: Nis: Yugoslavia, 1997
Физ. характеристика: с.111-114