Инд. авторы: Gadiyak G.V.
Заглавие: Theoretical Model and Computer Simulation Results of Enhanced Diffusion of High-Temperature Implanted Aluminum in Silicon Carbide. Power Semiconductor Materials and Devices, Ed. S.J.Pearton, R.J.Shul
Библ. ссылка: Gadiyak G.V. Theoretical Model and Computer Simulation Results of Enhanced Diffusion of High-Temperature Implanted Aluminum in Silicon Carbide. Power Semiconductor Materials and Devices, Ed. S.J.Pearton, R.J.Shul // MRS. - 1997. - Vol.483. - P.223-227.
Издано: 1997
Физ. характеристика: с.223-227