Peculiarities of silicon etching intensification in CF<sub>4</sub>O<sub>2</sub> plasma

Grigoriev Y.N.; Gorobchuk A.G.

Инд. авторы:	Grigoriev Y.N., Gorobchuk A.G.
Заглавие:	Peculiarities of silicon etching intensification in CF₄O₂ plasma
Библ. ссылка:	Grigoriev Y.N., Gorobchuk A.G. Peculiarities of silicon etching intensification in CF₄O₂ plasma // Proceedings of International conference on the methods of aerophysical research. Novosibirsk, 2007. - Part 3. - P.129-134.
Издано:	Novosibirsk: , 2007
Физ. характеристика:	с.129-134